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Atomic Spectroscopy for Advanced Thin Film Process Control

Advances in thin film coating and architectures are quickly outpacing the capacities of conventional monitoring systems. AtOMS (Atomic Absorption Optical Emission Spectroscopy System), powered by Accustrata, enables you to move beyond traditional method of monitoring and process control by measuring where it matters. Establish a competitive edge in manufacturing yield, product performance, and process stability in thin film etching and deposition.

Operational Environments that will benefit from AtOMS

Key Features

  • Developed by Accustrata under US Department Energy Program for in-situ process control in the manufacturing of extreme UV optical coating for 13.5 nm lithography.
  • Simultaneously monitors deposition rate, film, quality and composition.
  • Monitors any material: metals, alloy, opaque materials, semiconductors and dielectrics.
  • Fiber optics-based solution allows installation on any chamber geometry without chamber redesign.
  • Multi-beam measurement close to substrate allows in-situ control of uniformity.
  • Optical components uniquely designed to prevent sensor contamination.
  • Works with any substrate shape and rotation.
  • Reduced maintenance and cost compared to quartz crystal and optical monitors.

How it Works

  • The system collects the plasma emission in the range 190-800 nm in real-time and analyzes the spectrum to detect specific emission peaks of some elements and radicals, that are specific for the deposition/etching process.
  • The system launches a probe beam of light at a wavelength, specific to the element it needs to monitor. It uses a specific hollow cathode light (HCL) sources, which emit the desired wavelength.

Specifications

  • Multi-sensor installation for multiple probe beams tracing the plasma close to the substrate for unprecedented control of film thickness and composition uniformity.
  • Fiber optics component holder/frame inside the PVD chamber in the vicinity of the substrate or on the substrate holder.
  • Fiber optics feedthrough for guiding fibers into the chamber.
  • Situ sensor heads provide freedom and flexibility for monitoring.

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